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Trimethylaluminum High Purity (TMA-HP)
Trimethylaluminum, high purity, often abbreviated as TMA-HP, with the chemical formula, Al (CH3)3, is a preferred metal organic precursor source for the atomic layer deposition (ALD) or chemical vapor deposition (CVD) of aluminum-containing compound in semiconductors. Applications of -HP include high-K dielectric material for semiconductor chips, high efficiency photovoltaic cells, light emitting…
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