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  • Trimethylaluminum High Purity (TMA-HP)
    Trimethylaluminum, high purity, often abbreviated as TMA-HP, with the chemical formula, Al (CH3)3, is a preferred metal organic precursor source for the atomic layer deposition (ALD) or chemical vapor deposition (CVD) of aluminum-containing compound in semiconductors. Applications of -HP include high-K dielectric material for semiconductor chips, high efficiency photovoltaic cells, light emitting…
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  • Triethylaluminum (eTMA)
    Trimethylaluminum, electronic grade, often abbreviated as E-TMA, with the chemical formula, Al (CH3)3, is a preferred metal organic precursor source for the atomic layer deposition (ALD) or chemical vapor deposition (CVD) of aluminumcontaining compound in semiconductors. Applications of E-TMA include high-K dielectric material for semiconductor chips, high efficiency photovoltaic cells, light…
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  • Triethylaluminum (TEA)
    Triethylaluminum (TEA) is used primarily as a catalyst component in Ziegler- Natta type systems for olefin and diene polymerizations. It is also used in ethylene oligomerization to produce olefins and, in chain growth of ethylene, to produce longer chain aluminum alkyls, which are then converted to primary alcohols or other products.
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