Trimethylaluminum, high purity, often abbreviated as TMA-HP, with the chemical formula, Al (CH3)3, is a preferred metal organic precursor source for the atomic layer deposition (ALD) or chemical vapor deposition (CVD) of aluminum-containing compound in semiconductors.

Ethylaluminum sesquichloride (EASC) is used primarily as a catalyst component in Ziegler-Natta type systems for olefin and diene polymerizations. Other applications include ethylation of metals and certain organic carbonyl compounds.

Trimethylaluminum, Solar Purity Grade, abbreviated as TMA-SP, with chemical formula, Al(CH3)3, is a preferred organometallic precursor.

Ethylaluminum dichloride (EADC) is used primarily as a catalyst component in Ziegler-Natta type systems for olefin and diene polymerizations.

Diisobutylaluminum chloride (DIBAC) is used primarily as a catalyst component in Ziegler-Natta type systems for olefin and diene polymerizations.

Diisobutylaluminum hydride (DIBAH) is an excellent reducing agent, finding use in pharmaceutical, flavor, fragrance and other fine chemical processes requiring an active hydrogen reducing agent.

Diethylaluminum chloride (DEAC) is used primarily as a catalyst component in Ziegler-Natta type systems for olefin and diene polymerizations.

Diethylaluminum Ethoxide (DEAOE) is used primarily as a catalyst component in Ziegler-Natta type systems for olefin polymerizations.