Diethyltoluenediamine is an effective extender for polyurethane elastomers, particularly in RIM applications. Other uses are as curing agent for polyurethanes and epoxies; antioxidant for elastomers, lubricants and industrial oils; and as a chemical intermediate.

ETHACURE 100 curative is an effective curing agent for polyurethanes and epoxy resins. It may also be used as a chain extender for polyurethane and polyurea elastomers, particularly in reaction injection molding and spray applications.

Tri-n-butylaluminum (TNBA) is used primarily as a catalyst component in Ziegler-Natta type systems for olefin and diene polymerizations. Other applications include use in alkylation reactions and as a catalyst component in linear oligomerization and cyclization of unsaturated hydrocarbons.

Tri-n-hexylaluminum (TNHA) can be used as a component of Ziegler-Natta catalysts for olefin and diene polymerizations. It may also be used to alkylate other metals or as an alkylating agent in organic syntheses. Certain transition metal salts may be reduced by tri-n-hexylaluminum.

Ultra-low hydride triethylaluminum (ULH-TEA) is used primarily as a catalyst component in Ziegler-Natta type systems for olefin and diene polymerizations.

Tri-n-octylaluminum (TNOA) is used primarily as a catalyst component in Ziegler-Natta type systems for olefin and diene polymerizations. Other applications include use in alkylation reactions and as a catalyst component in linear oligomerization and cyclization of unsaturated hydrocarbons.

Trimethylaluminum, electronic grade, often abbreviated as E-TMA, with the chemical formula, Al (CH3)3, is a preferred metal organic precursor source for the atomic layer deposition (ALD) or chemical vapor deposition (CVD) of aluminumcontaining compound in semiconductors.

Triethylaluminum (TEA) is used primarily as a catalyst component in Ziegler- Natta type systems for olefin and diene polymerizations.

Triisobutylaluminum (TIBA) is used primarily as a catalyst component in ZieglerNatta type systems for olefin and diene polymerizations. Other applications include use as a reducing agent with selective activity in certain organic reduction reactions and as a chemical intermediate.

Trimethylaluminum, high purity, often abbreviated as TMA-HP, with the chemical formula, Al (CH3)3, is a preferred metal organic precursor source for the atomic layer deposition (ALD) or chemical vapor deposition (CVD) of aluminum-containing compound in semiconductors.